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Electrophoretic Deposition and Characterization of TiO2/Nb2O5 Composite Thin Films for Dye Sensitized Solar Cells

John Nguu, Francis Nyongesa, Robinson Musembi, Bernard Aduda

Journal of Materials Physics and Chemistry. 2018, 6(1), 1-8 doi:10.12691/jmpc-6-1-1
  • Figure 1. Schematic set-up of the EPD cell
  • Figure 2. Assembly of dye sensitized cell based on TiO2/Nb2O5 composite thin film
  • Figure 3. Variation in film thickness of TiO2/Nb2O5 films with EPD deposition voltage
  • Figure 4. Variation of transmittance with wavelength in TiO2/Nb2O5 composite films of various thicknesses deposited at 35.0 V for 90.0s.
  • Figure 5. SEM images of TiO2/Nb2O5 composite films (a) 5.5 μm film showing uniform coating before annealing, (b) 12.0 μm film before annealing showing agglomeration (c) 12.0 μm film showing micro cracks after annealing at 450.0°C and (d) 5.5 μm film showing absence of micro cracks after annealing
  • Figure 6. The photocurrent density – photovoltage (J – V) curves based on TiO2/Nb2O5 composite thin films
  • Figure 7. Variation of (αhν)2 versus hν for direct band gap transitions in (a) TiO2/Nb2O5 composite (b) TiO2 and (c) Nb2O5 films.
  • Figure 8. Variation in Band gap energy with annealing time for TiO2/Nb2O5 composite films annealed at 450.0 °C.
  • Figure 9. (a) Nyquist plot. Inset is the equivalent circuit (b) Bode plot and (c) Bode phase plots of DSSC assembled using TiO2/Nb2O5 composite electrode films. The cells were subjected to 0.5V forward biasing