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From

The Focusing Characteristics on the Binary Phase Sub-wavelength Fresnel Zone Plate

Taikei Suyama

International Journal of Physics. 2019, 7(3), 86-90 doi:10.12691/ijp-7-3-3
  • Figure 1. Schematic cross section of a circular binary phase FZP
  • Figure 2. Incident direction of light. (a) incidence from the substrate side of the FZP, (b) incidence from the structure side of the FZP
  • Figure 3. The intensity distribution of the diffraction field in x-y plane and y-z plane for different etch depths of 200, 400 and 600 nm, where (a) and (b) show the cases of incident light from the substrate and FZP’s structure sides, respectively
  • Figure 4. The intensity distribution along x direction in the focal plane (a) and along the optical z-axis (b), where the etch depth of 400 nm is kept invariable. The solid and dot curves respond to the cases of light incident from the FZP’s substrate and structure sides, respectively, and all intensity normalized to the intensity of the incident light
  • Figure 5. Dependence of focusing intensity (Im), spot size (FWHM) along the x direction in the focal plane, depth of focus (DoF), and focal length (f) on the etch depth. The solid and dot curves respond to the cases of light incident from the FZP’s substrate and structure sides, respectively