Figure 3. The intensity distribution of the diffraction field in x-y plane and y-z plane for different etch depths of 200, 400 and 600 nm, where (a) and (b) show the cases of incident light from the substrate and FZP’s structure sides, respectively

From

The Focusing Characteristics on the Binary Phase Sub-wavelength Fresnel Zone Plate

Taikei Suyama

International Journal of Physics. 2019, 7(3), 86-90 doi:10.12691/ijp-7-3-3